Keynote & Invited Speakers
Keynote Speakers
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Session 1
Status and challenges of high NA EUV ECO-system
- Kurt Ronse (imec, Belgium)
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Session 6
Holistic Approaches Toward High NA EUV Lithography
- Seiji Nagahara (Tokyo Electron Ltd., Japan)
Invited speakers
Session 1
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Applications of EUV Metrology Tools
- Matt Hettermann (EUV Tech, USA)
Session 2
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Actinic patterned mask inspection for EUV Lithography
- Toshiyuki Todoroki (Lasertec, Japan)
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In-line Scanning Probe Technologies for Mask Defect Inspection and Repair
- Sang-Joon Cho (PARK SYSTEMS, Korea)
Session 3
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TELs Patterning Technologies for Next Generation Lithography Using Nanoimprint Lithography
- Tomohito Yamaji (Tokyo Electron Ltd., Japan)
Session 4
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Nanoimprint_From Sinlge DIE to Wafer Level
- Christine Thanner (EV Group, Austria)
Session 5
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High NA EUV: Progress update and mask impact
- Jan van Schoot (ASML Netherlands B.V., Netherlands)
Session 7
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The impact of real curve layout in Mask Data Preparation
- Masakazu Hamaji (Nippon Control System Corporation, Japan)
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You don't need 1nm contours for curvilinear shapes: Pixel-based computing is the answer
- Abhishek Shendre (D2S, Inc., USA)
Session 9
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Spatial frequency breakdown of CD variation
- Tatiana Kovalevich (imec, Belgium)
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ZEISS AIMS EUV High NA for Actinic Mask Review with EXE:5000 Scanner Emulation
- Klaus Gwosch (Carl Zeiss SMT GmbH, Germany)
Session 10
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11th eBeam Initiative Survey Reports EUV Fueling Photomask Industry Growth
- Aki Fujimura (D2S, Inc., USA)
Session 11
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Pixel-based Data Preparation System for Digital Scanner
- Yuho Kanaya (NIKON CORPORATION, Japan)
Session 13
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Multi-Beam Mask Writing: A versatile technology from mature to high-end nodes
- Annette Schnettelker (IMS Nanofabrication GmbH, Austria)