Keynote Speaker
-
Session 6
Holistic Approaches Toward High NA EUV Lithography
- Seiji Nagahara (Tokyo Electron Ltd., Japan)
Biography
Personal History:
Dr. Seiji Nagahara took Bachelor, Master, and Ph.D. degrees in Engineering at Osaka University, Japan.
He was a lithographer in Renesas Electronics, NEC Electronics, and NEC. He researched lithography related technologies in a variety of places including IMEC (Belgium), University of California, Berkeley (USA), Argonne National Laboratory (USA), EIDEC (Japan) and Toshiba (Japan) in addition to TEL.
He is active as an author of technical papers, book chapters, and patents in patterning technologies. He also contributes to the academic and technical societies as a committee member such as steering committee chair of MNC2023.
Present:
Dr. Seiji Nagahara is Senior Director / Senior Chief Engineer in Tokyo Electron Ltd (TEL). He now works for marketing and development of the next generation coater and developer equipment and technologies for future lithography such as EUV lithography.
Main field of research:
Resist process for EUV lithography including CAR and MOR
Process equipment development for EUV resist processes