Biography

Personal History:
Kurt Ronse, Ph.D. has been working in the field of lithography at imec for over 30 years with responsibilities ranging from lithography researcher, lithography group manager, advanced patterning department director and advanced lithography program director.
Prior to joining imec, Ronse received a Ms. and Ph.D. degree in Electrical Engineering from the University of Leuven (Belgium).
In 2016, he has been elected Fellow of SPIE for achievements in microlithography and advanced patterning.

Present:
Currently is leading the Advanced Patterning Program that is focusing primarily on the enablement of High NA EUV lithography ECO system and on the extendibility of EUVL to the next technology nodes for logic and DRAM. Also the feasibility of exploratory patterning techniques like DSA and ASD are being assessed.

Main field of research:
Lithography/patterning solutions for advanced logic and DRAM nodes