Abstract Submission

To Submit an Abstract

  • Abstracts must be written and presented in English.
  • All abstracts must be submitted electronically in a PDF File via this symposium website. No fax and e-mail submission are accepted.
  • Deadline: November 29, 2019 December 6, 2019 (extended) Please note: the electronic abstract submission system will be closed on December 6, 2019 and late abstracts will not be accepted.
  • You will receive your reference number in return by e-mail when the submission succeeded. If you do not receive a response within 24 hours, please contact the Abstract Submission Office.

Instructions to Authors for the Preparation of your Abstract

Please click here to download “Abstract Template 2020”.
This describes instructions for the preparation of an abstract and can be used as a template.

All abstracts must contain the following information

1. Title of Abstract:
The title of the abstract should be written in Times New Roman, bold, 16pt, centered. Initial letters of each word should be capitalized.
2. Names of All Authors:
Author's name and affiliation spelled out completely in Times New Roman, 12pt, centered. Initial letters of each word must be capitalized. If there are several authors or affiliations, Presenting Author should be listed first and the related numbers should be given using superscripts. Also include the mailing address, and email address.
3. Abstract Text and Figures:
Text should be approximately 250 words, not exceeding one A4 page including figures.


From 2019, the one-page abstract which will be submitted by December 6 basically will be used for “Photomask Japan 2020 Digest of Papers”.

Please keep in mind that No Camera-ready Abstract is needed.

  • * It is possible to replace the accepted abstract to the revised one for “Digest of Papers” no later than February 14, 2020. How to submit the revised abstract will be notified in the middle of January 2020.


You are requested to choose topic applicable to your abstract from among the items listed in the Themes and Topics below.

  1. Materials for Photomasks
  2. Fabrication Process Steps and Equipments for Photomasks
    (Developing, Etching, Cleaning etc.)
  3. Photomask Writing Tools and Technologies including Multi-Beam EB Writer
  4. Tools and Technologies for Metrology/ Inspection/ Repair
  5. Technologies and Infrastructures for EUVL Masks
  6. Technologies and Infrastructures for NIL Masks
  7. Technologies and Infrastructures for FPD Masks
  8. Mask Data Preparations, EDA and DTCO
  9. Photomasks with RET: PSM, OPC, SMO and Multiple Patterning
  10. Photomask-related Lithography Technologies
  11. DSA (Directed Self-Assembly) related Mask Technologies
  12. Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.
  13. Patterning Technologies for Semiconductor and Electronic Devices
  14. Semiconductor Manufacturing Technologies
  15. EB Direct Writing, EB Lithography Technologies
  16. Mask/ Lithography related Technology in Academia (Poster Session)

Mask/Lithography related Technology in Academia (Poster session)

PMJ offers an opportunity for university students or postdoctoral researchers to present their works on mask/lithography technology fields in a poster session.
Those who wish to present their works need to submit an abstract via online in accordance with the above.

Session Date:
April 20, 2020 (tentative)
Session Scope:
Mask technology, lithography technology and applications
Object Presenter:
Applicants should be university students or postdoctoral researchers
Registration fee:
Free for presenter

Notification of Acceptance

Photomask Japan Program Committee will review all contributed abstracts. Applicants will be notified of acceptance or rejection by e-mail no later than the middle of January 2020.


Please note that the accepted authors should submit their 4-to-6-page manuscript for SPIE Proceedings. The author guidelines for manuscript will be available on this symposium website in January 2020.

For any inquiries about abstract submission, please contact

Photomask Japan 2020 Abstract Submission Office
c/o JTB Communication Design, Inc.
Celestine Shiba Mitsui Bldg., 3-23-1 Shiba, Minato-ku, Tokyo 105-8335, Japan
Phone : +81-3-5657-0777
Fax : +81-3-3452-8550


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